RF power supply is the driving source of plasma industrial equipment, which is mainly used for coating, plasma cleaning, CO2 laser and other equipment.
International mainstream brands include AE, MKS, COMDEL and so on. The power is 600 w1000 w 200 w 300 w 500 w; The advantage of replacing high frequency power supply with RF power supply is that the matching angle and discharge voltage can be changed flexibly.
The output voltage of a set of 1KW RF power supply can reach 6KV after the matching angle is modified by the matcher. After the discharge is stable, the matching angle is automatically adjusted to reduce the discharge voltage.
The system can be used in semiconductor industry. Include etching, RIE, parallel plate, ICP, RF sputtering, CVD and PVD systems.
The automatic matcher adopts a unique "gradient descent high-speed tuning algorithm", which can gradually slow down the adjustment speed when it approaches the tuning point.