Is the internal layout of products a patented technology?

Patent layout refers to the patent strategy of enterprises to restrict or prevent competitors from entering specific technical fields and using their innovative technologies by building high-tech barriers, or to make other similar products unable to obtain specific functions brought by technology. Specifically, through the detailed analysis of products and technical methods, innovative technical points are protected through patent applications, and the full coverage of patent protection is achieved through the widest possible scope of protection, so that other enterprises will use patented technology as long as they produce the same products, which constitutes infringement.

To do a good job in patent layout, a team covering three business skills needs to be formed: 1) technology research and development or innovation; 2) Patent information analysis; 3) Patent agency.

General method of patent layout: 1) Patent information analysis: analyze patents around products to find out the patent distribution and patent application of competitors, and whether there is a patent minefield. 2) Innovative technology mining: analyze the technology of products or processes, list key technologies, and find out innovative contents. Analyze the correlation between innovation and product or process, and determine the key technology or process. Analysis of innovation and core technologies: First, whether patent protection is applicable; The second is to exhaustively analyze possible technologies; The third is to determine the technologies and processes that need patent protection. Organize to fill in technical disclosure and communicate with patent agencies. 3) Target evaluation: determine the current and future target market (international) of the product, and determine the technical sum of the PCT patent application according to the target market situation. 4) Organizing the application: entrusting the patent agency to write the application. 5) Continuous evaluation and dynamic tracking of patent layout.