1, growth equipment: for the growth of gallium nitride semiconductor film equipment, such as MOCVD (Metal Organic Chemical Vapor Deposition) equipment, MBE (Molecular Beam Epitaxy) equipment, etc., these devices can control the growth rate of gallium nitride film, thickness, doping, and other parameters, in order to obtain high-quality gallium nitride semiconductor materials.
2, processing equipment: GaN semiconductor materials for cutting, grinding, polishing and other processing equipment, such as cutting machines, grinding machines, polishing machines, etc., these devices can improve the surface quality of GaN semiconductors and reduce the density of defects, thereby improving device performance.