What is the reason why the back of semiconductor developing equipment is not cleaned cleanly?

Cleaning equipment problem, cleaning solution problem.

1. The cleaning module of the developing equipment is faulty or abnormal, which leads to incomplete cleaning of the back surface, which is caused by insufficient supply of cleaning liquid, nozzle blockage, improper setting of cleaning time, etc.

2. The poor quality or incorrect proportion of the cleaning solution used leads to poor cleaning effect, and the composition, concentration and pH value of the cleaning solution will affect the cleaning effect.